FKM O Ring Chemical Resistance

Loj: Standard, customized ua

Xim: dub, xim av, liab, ntsuab, raws li koj xav tau

FKM o nplhaib tshuaj tiv thaiv yog qhov zoo heev, vim fluoroelastomer muaj tshuaj lom neeg ruaj khov thiab yog ib qho zoo tshaj plaws xov xwm tiv thaiv elastomers tam sim no.

Hom 26 fluororubber yog resistant rau roj av raws li cov roj, roj diester, silicone acid roj, inorganic acids (xws li 67 feem pua ​​sulfuric acid ntawm 140 degree, concentrated hydrochloric acid ntawm 70 degree, thiab 30 feem pua ​​nitric acid ntawm 90 degree), thiab feem ntau cov organic. Cov kuab tshuaj (xws li chlorinated hydrocarbons, benzene, roj av siab, butadiene, styrene, propylene, phenol, fatty acids ntawm 275 degree, thiab lwm yam). Tab sis nws tsis tiv taus qis molecular ketones, ethers, esters, amine, ammonia, hydrofluoric acid, chlorosulfonic acid thiab phosphoric acid hydraulic roj.

Qhov nruab nrab kev ua tau zoo ntawm 23 hom fluorine kua nplaum zoo ib yam li 26 hom fluorine kua nplaum, thiab nws yog qhov tshwj xeeb dua. Nws yog resistant rau muaj zog oxidizing inorganic acids, xws li fuming nitric acid thiab concentrated sulfuric acid. Nws qhov kev ua tau zoo yog zoo dua li hom 26. Tom qab immersion hauv 98 feem pua ​​​​nitric acid nyob rau hauv chav tsev kub rau 27 hnub, nws ntim expansion tsuas yog 13 feem pua ​​~ 15 feem pua.

Tsis tas li ntawd, muaj lwm hom FKM xws li FEPM, ETP, FFKM, lawv cov tshuaj tiv thaiv zoo dua li 26 lossis 23 hom FKM.

Cim npe nrov: fkm o nplhaib tshuaj tsis kam